Andreas Aal, Volkswagen, Wolfsburg, Germany

Andre Clausner, Fraunhofer IKTS Dresden, Germany

Hajdin Ceric, University Vienna, Austria

Reinhold Dauskardt, Stanford University, Palo Alto/CA, US

Christoph Eberl, Fraunhofer IWM Freiburg, Germany

Reyes Elizalde, Ceit, San Sebastian, Spain

Ude Hangen, Hysitron, Aachen, Germany

Ellen Hieckmann, TU Dresden, Germany

Paul Ho, UT Austin/TX, US

Tengfei Jiang, University of Central Florida/FL, US

Shoji Kamiya, Nagoya Institute of Technology, Japan

Christoph Kirchlechner, Max-PlanckInstitut Düsseldorf, Germany

Armen Kteyan, Mentor Graphics, Fremont/CA, US

Han Li, Intel, Portland/OR, US

Jim Lloyd, SUNY Albany/NY, US

Sven Niese, AXO Dresden, Germany

Cev Noyan, Columbia University/NY, US

Thomas Nuytten, IMEC Leuven, Belgium

Henry Proudhon, MINES ParisTech, France

Han-Ping Pu, TSMC, Taiwan

Manfred Reiche, Max–Planck-Institut Halle, Germany

Valeriy Sukharev, Mentor Graphics, Fremont/CA, US

Olivier Thomas, Aix Marseille University, France

Dietmar Vogel, Fraunhofer ENAS Chemnitz, Germany

Xiaopeng Xu, Synopsys, Mountain View/CA, US

Wenbing Yun, Sigray, Concord/CA, US